发明名称 SYSTEMS AND METHODS FOR PLASMA APPLICATION
摘要 The present disclosure provides for a plasma system including a plasma device coupled to a power source, an ionizable media source and a precursor source. During operation, the ionizable media source provides ionizable media and the precursor ionizable media source provides one or more chemical species, photons at specific wavelengths, as well as containing various reactive functional groups and/or components to treat the workpiece surface by working in concert for synergetic selective tissue effects. The chemical species and the ionizable gas are mixed either upstream or midstream from an ignition point of the plasma device and once mixed, are ignited therein under application of electrical energy from the power source. As a result, a plasma effluent and photon source is formed, which carries the ignited plasma feedstock and resulting mixture of reactive species to a workpiece surface to perform a predetermined reaction.
申请公布号 EP2435607(A4) 申请公布日期 2015.01.07
申请号 EP20090845329 申请日期 2009.09.30
申请人 COLORADO STATE UNIVERSITY RESEARCH FOUNDATION 发明人 KOO, IL-GYO;MOORE, CAMERON A.;COLLINS, GEORGE J.;CHO, JIN-HOON
分类号 C25F1/00 主分类号 C25F1/00
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