发明名称 SHEAR STRESS CONTROLLABLE WAX DEPOSITION SYSTEM
摘要 <p>The present invention relates to a wax deposition inducing apparatus capable of precisely controlling shear stress. The wax deposition inducing apparatus capable of precisely controlling the shear stress according to the present invention comprises: a wax deposition cell housing an oil specimen which becomes an object under test; a temperature unit forming a temperature gradient between a central part and an external wall part of the wax deposition cell; a rotational rod applying the shear stress to the wax adhered to an inner wall of the wax deposition cell by being inserted into the central part of the wax deposition cell and being rotated; a driving unit for rotating the rotational rod; and a controller controlling the driving unit and the temperature unit.</p>
申请公布号 KR101479560(B1) 申请公布日期 2015.01.07
申请号 KR20130156078 申请日期 2013.12.16
申请人 KOREA MARITIME UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION 发明人 LIM, JONG SE;KANG, PAN SANG;LEE, DONG GUN
分类号 G01N11/00;E21B43/00;G01M99/00;G01N33/26 主分类号 G01N11/00
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