发明名称 抵抗変化型メモリセル構造および方法
摘要 <p>Resistance variable memory cell structures and methods are described herein. One or more resistance variable memory cell structures include a first electrode common to a first and a second resistance variable memory cell, a first vertically oriented resistance variable material having an arcuate top surface in contact with a second electrode and a non-arcuate bottom surface in contact with the first electrode; and a second vertically oriented resistance variable material having an arcuate top surface in contact with a third electrode and a non-arcuate bottom surface in contact with the first electrode.</p>
申请公布号 JP5649722(B2) 申请公布日期 2015.01.07
申请号 JP20130511144 申请日期 2011.05.09
申请人 发明人
分类号 H01L27/105;H01L45/00;H01L49/00 主分类号 H01L27/105
代理机构 代理人
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