| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition apparatus that has a function for moving a substrate held in a deposition chamber in three-dimensional directions and also reduces the amount of deposition-participating substances entering a bellows that is provided in association with the function. SOLUTION: The film deposition apparatus includes: the deposition chamber 10 for depositing a film with respect to a surface of the substrate 2 under a vacuum state; a substrate holding device 20 penetrating through an opening 10a formed in the deposition chamber 10 and holding the substrate 2; a substrate driving device 30 for moving the substrate 2 via the substrate holding device 20 in three-dimensional directions; the bellows 60 storing at least part of the substrate holding device 20 and provided in the opening 10a so as to communicate one end 60a thereof with the opening; a shielding device 80 for closing the opening 10a so that the substrate holding device 20 is slidably movable; and an urging device 90 for pressing the shielding device 80 onto an upper inner wall surface 10d of the deposition chamber 10. COPYRIGHT: (C)2012,JPO&INPIT |
