| 摘要 |
PROBLEM TO BE SOLVED: To prevent polishing defects, such as scratches and undulations, on a transparent conductive film. SOLUTION: A polishing agent is composed of fine particles of a functional group-containing organic polymer compound capable of hydrolyzing a transparent conductive film made of ITO, FTO, or the like. As a functional group, a cationic group, such as an amino group, and an anionic group, such as a carboxyl group, may be adopted. As an organic polymer compound, polyacrylic acid ester, polyacrylamide, polystyrene, and the like are suitable. The polishing agent is dispersed in a dispersion medium including at least water, and is used for chemical mechanical polishing, by means of a loose grain method, on a transparent conductive film. COPYRIGHT: (C)2012,JPO&INPIT |
