发明名称 STRUCTURE AND METHOD FOR STRAIN-RELIEVED TSV
摘要 A semiconductor die including strain relief for through substrate vias (TSVs). A method for strain relief of TSVs includes defining a through substrate via cavity in a substrate. The method also includes depositing an isolation layer in the cavity. The method further includes filling the cavity with a conductive material. The method also includes removing a portion of the isolation layer to create a recessed portion.
申请公布号 EP2820671(A1) 申请公布日期 2015.01.07
申请号 EP20130708323 申请日期 2013.02.26
申请人 QUALCOMM INCORPORATED 发明人 RAMACHANDRAN, VIDHYA;GU, SHIQUN
分类号 H01L21/768;H01L23/48 主分类号 H01L21/768
代理机构 代理人
主权项
地址