| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an antireflection base material for silica fine particles, by which high adhesion between the silica fine particles and a glass substrate can be obtained by specifying the surface state of the glass substrate after being cleaned to an antireflection film comprising the silica fine particles and a metal alkoxide binder, with regard to a manufacturing method of an antireflection base material used in a solar cell, a display panel or an optical lens. <P>SOLUTION: The method for manufacturing the antireflection base material for silica fine particles includes a process for reducing the concentration of carbon atom on the surface of a glass substrate to 9.5% or less by cleaning. <P>COPYRIGHT: (C)2008,JPO&INPIT |
