| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive film for sand blasting, in which a support body can be easily peeled from a photosensitive resin layer and a cissing defect is hardly caused even when the photosensitive resin layer is applied on a release layer. <P>SOLUTION: A photosensitive film for sand blasting comprises a support body, a release layer, a photosensitive layer and a cover film, layered in this order. The release layer contains (A') an alkali-soluble resin and (C') a urethane (meth)acrylate compound. The photosensitive resin layer contains (A) an alkali-soluble resin, (B) a photopolymerization initiator and (C) a urethane (meth)acrylate compound. <P>COPYRIGHT: (C)2012,JPO&INPIT |
