| 摘要 |
PROBLEM TO BE SOLVED: To provide an ellipsometry device that can observe the microstructure of an object at high contrast and high magnification and ensure work space for measuring means or operation means that is used in contact with or close to the surface of the object at the position on the observation side in the normal line direction to the surface of the object. SOLUTION: An ellipsometry microscope includes: an oblique illumination system that includes a light source, a polarizer and a phase compensator and emits an illumination light L4 obliquely to a sample surface SP; an imaging system; an analyzer 23; and an imaging element 24 for detecting an image by the imaging system on the detection surface 25. The imaging system is comprised of plural stages of a primary imaging system 10 including an objective lens 21 and a secondary imaging system 11 including an imaging lens 22. The magnification M1 of the objective lens 21 (for example,×1) is relatively set smaller than that M2 of the imaging lens 22 (for example,×100), so that an angleθ1 formed by the optical axis AX1 of the objective lens 21 and the imaging surface P1 of the primary imaging system 10 is relatively set larger. COPYRIGHT: (C)2011,JPO&INPIT |
