| 摘要 |
A batch type ashing apparatus using a remote radical generator is provided to prevent the abrasion of components installed in an inside of a reactor and damage of a wafer by using the remote radical generator. A reactor(100) performs an ashing process. A plurality of supporting plates(200) are installed in the inside of the reactor in order to stack substrates in a vertical direction. A radical supply path(400) is formed to connect a remote radical generator(300) with the reactor in order to supply radicals to the substrates. A heat-radiating plate(500) is installed at an outer surface of the radical supply path. An upper exhaust tube(610) and a lower exhaust tube(620) are connected to the reactor in order to exhaust gas from the reactor.
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