发明名称 METHOD FOR FORMING THIN FILM PATTERN
摘要 <p>To provide a method for forming a thin film pattern 14 having a predetermined shape on a surface of a substrate 1 having an electrode formed in advance in a thin film pattern forming region, there are included the steps of: bringing a resin film 2, which transmits visible light, into close contact with the substrate 1; irradiating the thin film pattern forming region 11 on the substrate 1 with laser light L, thereby forming an opening pattern 21 having the same shape as the thin film pattern 14 in the film 2; forming the thin film pattern 14 in the thin film pattern forming region 11 on the substrate 1 through the opening pattern 21 of the film 2; and peeling off the film 2.</p>
申请公布号 KR20150002654(A) 申请公布日期 2015.01.07
申请号 KR20147028436 申请日期 2013.03.25
申请人 V TECHNOLOGY CO., LTD. 发明人 KUDO SYUJI;MIZUMURA MICHINOBU;KAJIYAMA KOICHI;HANY MAHER AZIZ;KAJIYAMA YOSHITAKA
分类号 H01L51/56;C23C14/04;C23C14/14;H01L51/50;H05B33/10;H05B33/26 主分类号 H01L51/56
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