发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR WAFER ADHERING LAMINATE AND METHOD FOR PUTTING THE LAMINATE ON THE SEMICONDUCTOR WAFER
摘要 An adhesive sheet is provided with a peeling base material (10), a base material film (14), and a first adhesive layer (12) arranged between the peeling base material (10) and the base material film (14). On the peeling base material (10), an annular cut part (D) is formed from a plane on the side of the first adhesive layer (12). The first adhesive layer (12) is stacked to cover the entire plane on the inner side of the cut part (D) on the peeling base material (10). The cut depth (d) of the cut part (D) is less than the thickness of the peeling base material (10) and is 25mum or less.
申请公布号 KR20080093079(A) 申请公布日期 2008.10.17
申请号 KR20087024430 申请日期 2005.09.30
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 TANAKA MAIKO;URUNO MICHIO;MATSUZAKI TAKAYUKI;FURUTANI RYOJI;MASHINO MICHIO;INADA TEIICHI
分类号 C09J7/00;C09J201/00;H01L21/301 主分类号 C09J7/00
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