发明名称 SYSTEM FOR CONTROLING SEMICONDUCTOR MANUFACTURE EQUIPMENT AND STATISTICAL PROCESS CONTROL METHOD AT THE SAME
摘要 <p>A system for managing semiconductor fabricating equipments to increase or maximize reliability, and a statistical process management method thereof are provided to increase or maximize the reliability by managing process of all lots even if a part of variables are not measured. A plurality of unit process devices(10) perform various kinds of semiconductor unit processes. A plurality of measurers(20) measure pattern property of a wafer finishing each unit process in each process device. A host computer(30) detects abnormality of the unit process by using T-square statistics, which is calculated by a plurality of process parameters corresponding to the measured pattern property of the wager.</p>
申请公布号 KR20090002106(A) 申请公布日期 2009.01.09
申请号 KR20070055071 申请日期 2007.06.05
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI, SANG WOOK;TONG, SEUNG HOON;KIM, HYUNG SUN;LEE, HYUN CHEOL;LEE, HO YOUNG
分类号 G06F19/00;G06Q10/00;G06Q50/00 主分类号 G06F19/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利