| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive resin composition having a sufficient sensitivity, to provide an interlayer insulating film that uses the positive radiation-sensitive resin composition, has a superior melt flow resistance, heat resistance, and solvent resistance and has a superior voltage holding ratio, and to provide a formation method thereof.SOLUTION: The positive radiation-sensitive resin composition according to the present invention includes: [A1] polyorganosiloxane in which a content ratio of an organic group having an epoxy group out of organic groups bonded to silicon atom at a carbon atom is equal to or greater than 0 mol% but less than 50 mol% and [A2] polyorganosiloxane in which the content ratio of the same is equal to or greater than 50 mol% but less than 100 mol%. |
