发明名称 スパッタリング装置及びスパッタリング成膜方法並びにスパッタリング装置の電源制御方法
摘要 <P>PROBLEM TO BE SOLVED: To provide a sputtering system in which the change command of power source control is transmitted synchronously with the timing of a process treatment change to eliminate an error by the delay of a serial communication, and which has high precision and high reproducibility. <P>SOLUTION: The sputtering system includes a power source control unit having a function of transmitting a power source condition reading-out signal in which the reading-out of the condition of a power source performing the feed of electric power to a cathode part is carried out at a prescribed time cycle and an electric power application stop signal stopping the feed of electric power to the cathode part at a prescribed timing, to the power source by a serial communication. The power source control unit transmits a reading-out stop signal for stopping the transmission of the signal of the reading-out in the power source condition to stop the reading-out treatment in the condition of the power source, and thereafter, transmits an electric power application stop signal. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP5649426(B2) 申请公布日期 2015.01.07
申请号 JP20100272137 申请日期 2010.12.07
申请人 キヤノンアネルバ株式会社 发明人 金野 武郎
分类号 C23C14/34;H01L21/31;H05H1/24 主分类号 C23C14/34
代理机构 代理人
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