发明名称 |
SEMICONDUCTOR LASER MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor laser manufacturing method capable of improving yield.SOLUTION: A semiconductor laser manufacturing method is a method forming a resonator pattern including a first region having a diffraction grating pattern and a second region which is linked in a resonator length direction of the first region and has no diffraction grating pattern. The semiconductor laser manufacturing method comprises: a first process of providing a plurality of resonator patterns having lengths different from each other in the resonator length direction of the first region and arranged adjacent to each other in a direction crossing the resonator length direction; and a second process of leaving selected resonator patterns out of the plurality of resonator patterns and removing the other.SELECTED DRAWING: Figure 4 |
申请公布号 |
JP2016092416(A) |
申请公布日期 |
2016.05.23 |
申请号 |
JP20150212243 |
申请日期 |
2015.10.28 |
申请人 |
SUMITOMO ELECTRIC DEVICE INNOVATIONS INC |
发明人 |
ISHIURA MASAMI |
分类号 |
H01S5/12;H01S5/026;H01S5/227 |
主分类号 |
H01S5/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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