发明名称 SEMICONDUCTOR LASER MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor laser manufacturing method capable of improving yield.SOLUTION: A semiconductor laser manufacturing method is a method forming a resonator pattern including a first region having a diffraction grating pattern and a second region which is linked in a resonator length direction of the first region and has no diffraction grating pattern. The semiconductor laser manufacturing method comprises: a first process of providing a plurality of resonator patterns having lengths different from each other in the resonator length direction of the first region and arranged adjacent to each other in a direction crossing the resonator length direction; and a second process of leaving selected resonator patterns out of the plurality of resonator patterns and removing the other.SELECTED DRAWING: Figure 4
申请公布号 JP2016092416(A) 申请公布日期 2016.05.23
申请号 JP20150212243 申请日期 2015.10.28
申请人 SUMITOMO ELECTRIC DEVICE INNOVATIONS INC 发明人 ISHIURA MASAMI
分类号 H01S5/12;H01S5/026;H01S5/227 主分类号 H01S5/12
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