| 摘要 |
<p>An arrangement for and a method of characterising the polarisation properties of an optical system, in particular an optical system of a microlithographic projection exposure apparatus. The arrangement includes at least one polarisation state generator (130, 230, 330) which sets a defined polarisation state of radiation incident on the optical system, and a polarisation state detector (140, 240, 340) adapted to measure the exit polarisation state of radiation issuing from the optical system, wherein the optical system is designed for a working wavelength of less than 15 nm, and wherein the polarisation state generator and/or the polarisation state detector are so designed that their polarisation-optical action on an incident light beam is substantially constant over an angle spectrum of the light beam of at least 10°.</p> |
