| 摘要 |
A transistor fabricated on a semiconductor die (21) includes a first section (30a) of transistor segments disposed in a first area of the semiconductor die, and a second section (30b) of transistor segments disposed in a second area of the semiconductor die adjacent the first area. Each of the transistor segments in the first and second sections includes a pillar (17) of a semiconductor material that extends in a vertical direction. First and second dielectric regions (15a,15b) are disposed on opposite sides of the pillar. First and second field plates (19a,19b) are respectively disposed in the first and second dielectric regions. Outer field plates of transistor segments adjoining first and second sections are either separated or partially merged. |
