| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a proximity exposure device and proximity exposure method whereby variation in illumination intensity on an exposure surface due to gap distribution can be minimized by controlling the illumination intensity of each of a plurality of light source parts. <P>SOLUTION: The proximity exposure device PE comprises an illumination optical system 70 including: the plurality of light source parts 73; an exposure control shutter 78; an integrator lens 74; and a collimation mirror 77. The proximity exposure device PE emits light from an illumination optical system 70 toward a mask M located near and opposite a substrate W, thereby transferring a pattern P of the mask M onto the substrate W by exposure. The proximity exposure device PE is provided with a gap sensor 17 for measuring a gap between the mask M and the substrate W in a plurality of areas in the exposure area. The light source parts 73 alter the illumination intensities according to the respective corresponding gaps measured in the areas. <P>COPYRIGHT: (C)2013,JPO&INPIT |
