SUBSTRATE PROCESSING METHOD, PROGRAM, COMPUTER STORAGE MEDIUM AND SUBSTRATE PROCESSING SYSTEM

摘要

PROBLEM TO BE SOLVED: To appropriately form a predetermined pattern on a substrate by securing a high selection ratio in selectively removing first polymers having oxygen atoms in substrate processing using a block copolymer including the first polymers having the oxygen atoms and second polymers having no oxygen atom.SOLUTION: A substrate processing method includes: a block copolymer application step (step S4) for applying the block copolymer including the first polymers having the oxygen atoms and the second polymers having no oxygen atom onto a wafer on which the predetermined pattern is formed; a polymer separation step (step S5) for phase-separating the block copolymer into the first polymers and the second polymers; and a polymer removal step (step S6) for performing heating processing on the wafer in a low oxygen atmosphere after the polymer separation step and selectively removing the first polymers from the phase-separated block copolymer.SELECTED DRAWING: Figure 6