发明名称 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PHOTOMASK BLANK AND METHOD OF FORMING PATTERN
摘要 <p>Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a resin that when acted on by an acid, is decomposed to thereby increase its alkali solubility, which resin comprises at least either any of repeating units (I) of general formula (I) below or any of repeating units (II) of general formula (II) below, (B) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume ranges from 250Å3 to less than 350Å3, and (C) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume is 400Å3 or greater.</p>
申请公布号 EP2820478(A1) 申请公布日期 2015.01.07
申请号 EP20130755638 申请日期 2013.02.28
申请人 FUJIFILM CORPORATION 发明人 TAKAHASHI, KOUTAROU
分类号 G03F7/039;G03F7/004 主分类号 G03F7/039
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