发明名称 |
Method of manufacturing a template matching template, as well as a device for manufacturing a template |
摘要 |
Provided is a method of manufacturing a template matching template, as well as a device for manufacturing a template, by both of which high matching accuracy can be stably ensured without being affected by factors such as process variations. As an embodiment of the above, a method of manufacturing a template matching template, as well as a relevant device, is proposed by both of which a template memorized in advance and an image acquired by a microscope are compared, thereby identifying a desired position, and by which a plurality of images at the identified location are acquired by template matching, and the aforementioned plurality of images are added and averaged, thereby manufacturing a new template. |
申请公布号 |
US8929665(B2) |
申请公布日期 |
2015.01.06 |
申请号 |
US201013375131 |
申请日期 |
2010.05.21 |
申请人 |
Hitachi High-Technologies Corporation |
发明人 |
Yamada Yukari;Yang Kyoungmo;Kakuta Junichi |
分类号 |
G06K9/62;G06K9/00;G06T7/00 |
主分类号 |
G06K9/62 |
代理机构 |
McDermott Will & Emery LLP |
代理人 |
McDermott Will & Emery LLP |
主权项 |
1. A template-matching template creation method in which a desired location is identified by comparing a template stored in advance and an image acquired by a microscope, said template-matching template creation method comprising steps of:
accumulating a plurality of image data of a plurality of patterns formed under a same fabrication condition and at different fabrication timings, the plurality of image data having been acquired by said microscope, and the plurality of patterns having a same design; performing a template-matching process using a reference image and each of the accumulated plurality of image data of the plurality of patterns; and creating a template for template-matching by calculating an average of the plurality of image data of a predetermined number of patterns, locations of which are identified by the template-matching process while excluding old image data which has been used for the average calculation from the average calculation and including new image data of a pattern formed at a different fabrication timing in the average calculation. |
地址 |
Tokyo JP |