Pulse mode capability for operation of an RF/VHF impedance matching network with a 4 quadrant, V_RMS/I_RMSresponding detector circuitry

摘要

A physical vapor deposition system may include an RF generator configured to supply a pulsing AC process signal to a target in a physical vapor deposition chamber via the RF matching network. A detector circuit may be coupled to the RF generator and configured to sense the pulsing AC process signal and to produce a corresponding pulsing AC voltage magnitude signal and pulsing AC current magnitude signal. An envelope circuit may be electrically coupled to the detector circuit and configured to receive the pulsing AC voltage and current magnitude signals and to produce a DC voltage envelope signal and a DC current envelope signal. A controller may be electrically coupled to the envelope circuit and the RF matching network and configured to receive the DC voltage and current envelope signals and to vary an impedance of the RF matching network in response to the DC voltage and current envelope signals.

主权项

1. A method for tuning an RF matching network during pulsed mode operation, comprising:
transmitting a pulsing AC process signal from an RF generator to a plasma processing chamber via the RF matching network; sensing the pulsing AC process signal using a rod of a detector circuit coupled to the RF generator; generating a DC voltage envelope signal and a DC current envelope signal corresponding to the sensed pulsing AC process signal with an envelope circuit electrically coupled to the rod; and tuning the RF matching network with a controller electrically coupled to the RF matching network and the envelope circuit in response to the voltage and current envelope signals, wherein the RF matching network is tuned while the RF generator transmits the pulsing AC process signal to the plasma processing chamber via the RF matching network.