Auto focus system for reticle inspection

摘要

Methods and apparatus relating to the inspection of photomasks are described. In an embodiment, an inspection tool may be automatically focused on a reticle utilizing various topographic mapping techniques. Other embodiments are also described.

主权项

1. An apparatus comprising:
an image capture device to capture one or more images of a reticle; and a logic to focus a lens of the image capture device, wherein the logic is to focus the lens based on a topographical map comprising previously-stored height measurements Z of an upper surface of the reticle associated with X and Y coordinates of the reticle.