| 发明名称 | Plasma source | ||
| 摘要 | The invention relates to a plasma source (1) comprising: a conduit (3, 4) carrying a gas flow and an ionization chamber (10) in which a plasma is generated, wherein the ionization chamber (10) is connected to the conduit (3, 4), so that the gas flow in the conduit (3, 4) carries away gas particles out of the ionization chamber (10) thereby reducing the pressure in the ionization chamber (10). | ||
| 申请公布号 | US8926920(B2) | 申请公布日期 | 2015.01.06 |
| 申请号 | US200812598988 | 申请日期 | 2008.05.02 |
| 申请人 | Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V. | 发明人 | Morfill Gregor Eugen;Steffes Bernd |
| 分类号 | A61L9/00;B01J7/00;H05H1/24;H05H1/34;A61L2/00 | 主分类号 | A61L9/00 |
| 代理机构 | Caesar, Rivise, Bernstein, Cohen & Pokotilow, Ltd. | 代理人 | Caesar, Rivise, Bernstein, Cohen & Pokotilow, Ltd. |
| 主权项 | 1. A plasma source for generating a low temperature plasma, comprising: a) a conduit carrying a gas flow, the conduit comprising a nozzle arranged upstream of an ionization chamber, the conduit further comprising a conduit pipe arranged downstream of the ionization chamber, wherein an upstream end of the nozzle comprises an inlet for introducing a gas flow into the nozzle, and wherein the conduit pipe comprises an outlet at a downstream end thereof; b) a housing encasing the nozzle and the conduit pipe and defining the ionization chamber between the nozzle and the conduit pipe; and c) a plasma generator adapted to generate a low temperature plasma in the ionization chamber between the nozzle and conduit pipe, wherein: (i) the nozzle and the conduit pipe are arranged to reduce a pressure in the ionization chamber when the gas flow is carried by the conduit; and (ii) the outlet is arranged for applying the plasma to a surface. | ||
| 地址 | Munich DE | ||