Method for optical proximity correction

摘要

A smooth process is provided in the present invention. The smooth process is applied to a retarget layout, wherein the retarget layout is dissected into a plurality of segments. Furthermore, the retarget layout comprises a first original pattern, a first adding pattern and a second adding pattern. The smooth process includes changing the second adding pattern to a first smooth pattern. Latter, a second smooth pattern is added to extend from a bottom of the first smooth pattern and a tail portion of the first adding pattern is shrunk to a third smooth pattern. After the smooth process, an optical proximity correction process is applied to the smooth layout to produce an optical proximity correction layout.

主权项

1. A method for optical proximity correction, comprising:
obtaining a retarget layout after a retarget process, wherein the retarget layout is dissected into a plurality of segments, and the retarget layout comprises a first original pattern, a first adding pattern and a second adding pattern; using a computer to calculate a distance between adjacent parallel segments, if the distance is greater than a first predetermined value, processing a smooth process to modify the retarget layout to generate a smooth layout, wherein the smooth process comprises the steps of: (a) changing the second adding pattern to a first smooth pattern; and (b) adding a second smooth pattern extending from a bottom of the first smooth pattern and shrinking a tail portion of the first adding pattern to a third smooth pattern, and the tail portion of the first adding pattern connecting to a top of the first smooth pattern; and applying an optical proximity correction process to the smooth layout to produce an optical proximity correction layout.