| 摘要 |
<p>An object of the present invention is to provide a TiO 2 -containing quartz glass substrate which, when used as a mold base for nanoimprint lithography, can form a concavity and convexity pattern having a dimensional variation falling within ±10%. The invention relates to a TiO 2 -containing quartz glass substrate: in which a coefficient of thermal expansion in the range of from 15 to 35°C is within ±200 ppb/°C; a TiO 2 concentration is from 4 to 9 wt%; and a TiO 2 concentration distribution, in a substrate surface on the side where a transfer pattern is to be formed, is within ±1 wt%.</p> |
