Exposure apparatus and device fabrication method

摘要

An exposure apparatus for forming a predetermined pattern on a substrate by using exposure light, includes a stage apparatus which is movable with respect to an optical axis of the exposure light; a light-transmissive member provided at the stage apparatus, wherein a liquid is supplied on an upper surface of the light-transmissive member; and a measurement device which is settable below the light-transmissive member when measurement using the measurement device is performed. Leakage or entrance of a liquid used for exposure into an optical measurement device such as a wavefront aberration measurement device can be prevented, thereby enabling preferable optical adjustment such as imaging performance or optical characteristics.

主权项

1. An exposure apparatus comprising:
a stage apparatus configured to hold a substrate and having a surrounding portion that is arranged to surround the substrate; a liquid immersion system having a supply port and a collection port via which a liquid is supplied and collected respectively, to form a liquid immersion region; a projection optical system having an optical element and configured to project a pattern image onto the substrate through the liquid of the liquid immersion region that is formed between the optical element and a local area on the substrate; a light-transmissive member provided at the stage apparatus, the light-transmissive member having an upper surface that is substantially coplanar with an upper surface of the substrate held on the stage apparatus and with an upper surface of the surrounding portion of the stage apparatus; and a measurement system having a light-receiving part and configured to measure a wavefront aberration, the light-receiving part being provided at the stage apparatus and configured to receive light for measuring the wavefront aberration, through the liquid and through the light-transmissive member.