Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of the internal sensor

摘要

A lithographic apparatus includes a projection system constructed and arranged to project a beam of radiation onto a target portion of a substrate, an internal sensor having a sensing surface, and a mini-reactor movable with respect to the sensor. The mini-reactor includes an inlet for a hydrogen containing gas, a hydrogen radical generator, and an outlet for a hydrogen radical containing gas. The mini-reactor is constructed and arranged to create a local mini-environment comprising hydrogen radicals to treat the sensing surface.

主权项

1. A lithographic apparatus comprising:
a projection system constructed and arranged to project a beam of radiation onto a target portion of a substrate; an internal sensor having a sensing surface; and a mini-reactor movable with respect to the sensor, the mini-reactor comprising
an inlet for a hydrogen containing gas,a hydrogen radical generator, andan outlet for a hydrogen radical containing gas, the mini-reactor being constructed and arranged to create a local mini-environment comprising hydrogen radicals substantially only to the sensing surface to treat the sensing surface, wherein the mini-reactor comprises a reactor chamber with a chamber opening, and wherein an internal surface of the reactor chamber comprises a first material that does substantially not react with hydrogen and hydrogen radicals, the first material having a hydrogen radical surface recombination coefficient of less than or equal to about 0.02, and wherein an external part of the mini-reactor comprises a second material having a hydrogen radical surface recombination coefficient of greater than about 0.02; and a cooling element constructed and arranged to cool at least part of the mini-reactor.