| 发明名称 | Semiconductor devices including guard ring structures | ||
| 摘要 | A semiconductor device includes a substrate partitioned into a cell region, a peripheral circuit region, and an interface region between the cell region and the peripheral circuit region. A guard ring is provided in the interface region of the substrate and surrounds the cell region. A first gate structure is in the cell region, and a second gate structure is in the peripheral circuit region. | ||
| 申请公布号 | US8928073(B2) | 申请公布日期 | 2015.01.06 |
| 申请号 | US201313787147 | 申请日期 | 2013.03.06 |
| 申请人 | Samsung Electronics Co., Ltd. | 发明人 | Jang Se-myeong;Han Sang-hyun;Ban Hyo-dong |
| 分类号 | H01L29/66;H01L27/088;H01L21/8234 | 主分类号 | H01L29/66 |
| 代理机构 | Myers Bigel Sibley & Sajovec, P.A. | 代理人 | Myers Bigel Sibley & Sajovec, P.A. |
| 主权项 | 1. A semiconductor device comprising: a substrate including a cell region, a peripheral circuit region, and an interface region between the cell region and the peripheral circuit region; a guard ring formed in the interface region of the substrate and surrounding the cell region, wherein the guard ring comprises a portion of the substrate at an upper surface of the substrate and is defined by two adjacent isolation layers at the upper surface of the substrate; a first gate structure in the cell region; and a second gate structure in the peripheral circuit region. | ||
| 地址 | KR | ||