发明名称 Display device, switching circuit and field effect transistor
摘要 A this film transistor is provided. The thin film transistor includes a semiconductor layer including a source region, a drain region, and a channel region, wherein the channel region is provided between the source region and the drain region; and a gate electrode overlapping with the channel region, wherein the channel region includes at least a portion of a channel width that is configured to at least one of continuously decrease and continuously increase in a lengthwise direction.
申请公布号 US8928044(B2) 申请公布日期 2015.01.06
申请号 US201112984767 申请日期 2011.01.05
申请人 Japan Display West Inc. 发明人 Ozeki Yoshitaka;Kuwahara Yasuhito;Toriyama Shigetaka;Ikeda Hiroyuki
分类号 H01L29/00;H01L29/786;H01L29/423;G02F1/1362 主分类号 H01L29/00
代理机构 K&L Gates LLP 代理人 K&L Gates LLP
主权项 1. A thin film transistor comprising: a semiconductor layer including a source region, a drain region, and at least two channel regions provided between the source region and the drain region; and at least two gate electrodes overlapping with the channel regions, for applying gate voltage to the at least two channel regions, wherein the channel regions include a first portion whose width continuously linearly changes along a lengthwise direction from the source region to the drain region, and a second portion whose width is constant, wherein the first portion and the second portion are linearly connected in a direction from the source region to the drain region, and wherein the semiconductor layer between the at least two channel regions has at least two portions each having a different width.
地址 Chita-gun, Aichi-ken JP