发明名称 |
Display device, switching circuit and field effect transistor |
摘要 |
A this film transistor is provided. The thin film transistor includes a semiconductor layer including a source region, a drain region, and a channel region, wherein the channel region is provided between the source region and the drain region; and a gate electrode overlapping with the channel region, wherein the channel region includes at least a portion of a channel width that is configured to at least one of continuously decrease and continuously increase in a lengthwise direction. |
申请公布号 |
US8928044(B2) |
申请公布日期 |
2015.01.06 |
申请号 |
US201112984767 |
申请日期 |
2011.01.05 |
申请人 |
Japan Display West Inc. |
发明人 |
Ozeki Yoshitaka;Kuwahara Yasuhito;Toriyama Shigetaka;Ikeda Hiroyuki |
分类号 |
H01L29/00;H01L29/786;H01L29/423;G02F1/1362 |
主分类号 |
H01L29/00 |
代理机构 |
K&L Gates LLP |
代理人 |
K&L Gates LLP |
主权项 |
1. A thin film transistor comprising:
a semiconductor layer including a source region, a drain region, and at least two channel regions provided between the source region and the drain region; and at least two gate electrodes overlapping with the channel regions, for applying gate voltage to the at least two channel regions, wherein the channel regions include a first portion whose width continuously linearly changes along a lengthwise direction from the source region to the drain region, and a second portion whose width is constant, wherein the first portion and the second portion are linearly connected in a direction from the source region to the drain region, and wherein the semiconductor layer between the at least two channel regions has at least two portions each having a different width. |
地址 |
Chita-gun, Aichi-ken JP |