| 发明名称 | Projection exposure apparatus with optimized adjustment possibility | ||
| 摘要 | A microlithography projection objective includes an optical element, a manipulator configured to manipulate the optical element, and a control unit configured to control the manipulator. The control unit includes a first device configured to control movement of the manipulator, a memory comprising an upper bound for a range of movement of the manipulator, and a second device configured to generate a merit function based on a square of a root mean square (RMS) of at least one error and configured to minimize the merit function subordinate to the upper bound for the range of movement of the manipulator. | ||
| 申请公布号 | US8928858(B2) | 申请公布日期 | 2015.01.06 |
| 申请号 | US201213427030 | 申请日期 | 2012.03.22 |
| 申请人 | Carl Zeiss SMT GmbH | 发明人 | Bittner Boris;Walter Holger;Roesch Matthias |
| 分类号 | G03B27/52;G03B27/68;G03B27/54;G03F7/20;G03B27/42;G03B27/72 | 主分类号 | G03B27/52 |
| 代理机构 | Fish & Richardson P.C. | 代理人 | Fish & Richardson P.C. |
| 主权项 | 1. A system, comprising: an objective, comprising: an optical element; anda manipulator configured to manipulate the optical element; and a control unit configured to control the manipulator, the control unit comprising: a first device configured to control the manipulation of the optical element by the manipulator;a memory comprising a bound for a range of the manipulation of the optical element by the manipulator; anda second device configured to calculate a value of a merit function based on at least one error and configured to minimize the merit function subordinate to the bound for the range of the manipulation of the optical element by the manipulator, wherein the objective is a microlithography projection objective. | ||
| 地址 | Oberkochen DE | ||