发明名称 |
System for attachment of an electrode into an inductively coupled plasma source |
摘要 |
An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible. |
申请公布号 |
US8928210(B2) |
申请公布日期 |
2015.01.06 |
申请号 |
US201113307830 |
申请日期 |
2011.11.30 |
申请人 |
FEI Comapny |
发明人 |
Kellogg Sean;Graupera Anthony;Parker N. William;Wells Andrew B.;Utlaut Mark W.;Skoczylas Walter;Schwind Gregory A.;Zhang Shouyin;Smith Noel |
分类号 |
H01J1/02 |
主分类号 |
H01J1/02 |
代理机构 |
Scheinberg & Associates, PC |
代理人 |
Scheinberg & Associates, PC ;Scheinberg Michael O. |
主权项 |
1. A system for removable attachment of an electrode to an inductively coupled plasma source, comprising:
an inductively coupled plasma source having a reaction chamber; an interface layer attached to the reaction chamber; a mounting ring affixed to the interface layer; and a source electrode removably attached to the mounting ring, the combination of the interface layer, mounting ring and source electrode forming a heat conductive seal between the reaction chamber attaching portion and the source electrode. |
地址 |
Hillsboro OR US |