| 摘要 |
<p>A multifunctional load port apparatus according one embodiment of the present invention comprises a wafer storage unit storing at least one wafer, and a load port unit which makes the wafer storage unit settled, supports a wafer storage unit settled by separating from another wafer storage unit, and injects at least one kind of injection gas into the wafer storage unit or discharges various exhaust gas formed inside the wafer storage unit. The load port unit includes: a port stage part which makes the wafer storage unit settled and supports a wafer storage unit settled by separating from another wafer storage unit; a port main body that is disposed on the lower end of the port stage part and which has the fixed height and area and fixes the port stage part; a gas injection part that is disposed inside the port main body and formed to protrude through the port stage part, and which injects the injection gas into the wafer storage unit when the wafer storage unit is placed on the port stage part; a gas discharge part that is arranged inside the port main body and formed to protrude through the port stage part, and which discharges exhaust gas in the wafer storage unit when the wafer storage unit is placed on the port stage part; an impurity sensing part that is arranged on the gas discharge unit and which senses the impurities included in the exhaust gas; and a differential pressure sensing part that is arranged on the lower end of the port stage part and capable of sensing the condition of the wafer storage unit by sensing differential pressure applied to the wafer storage unit when the wafer storage unit is placed on the port stage part.</p> |
