Process for deposition and characterization of a coating

摘要

Provided herein are processes for depositing a plasma coating on a substrate and coated substrates obtained thereby. More particularly, processes for characterizing a plasma coating on a substrate are provided. The process for depositing a plasma coating includes the step of exposing the substrate to a plasma. The plasma includes at least one coating precursor and one fluorophore other than the coating precursor.

主权项

1. A process for characterizing a coating obtained via a plasma treatment or a plasma deposition process on a substrate, wherein said plasma is a dielectric barrier discharge (DBD), whereby an organic fluorophore is incorporated in said coating and wherein said coating is characterized by monitoring the fluorescence of said organic fluorophore.