| 摘要 |
A drawing apparatus performs drawing, with an array of charged particle beams, on shot regions arrayed on a substrate in a direction in parallel and with intervention of step movement of the substrate in the direction. The apparatus includes a driving device for relative movement between a stage and a charged-particle optical system in the direction. The optical system causes sub arrays (of charged particle beams), discretely arrayed in the direction, to be incident on the substrate, and includes deflectors configured to respectively deflect sub array sets each including at least one of the sub arrays. A controller controls the optical system and the driving device such that a region at one side of a boundary among the shot regions and a region at the other side are subjected to drawing not in parallel with a sub array existing over the boundary, but sequentially with intervention of the step movement. |
| 主权项 |
1. A drawing apparatus which performs drawing, with a plurality of charged particle beams on a substrate, on which a first shot region and a second shot region are formed next to each other, the apparatus comprising:
an aperture array configured to divide an incident charged particle beam into the plurality of charged particle beams including a first sub array in which a plurality of apertures are arrayed on a thin plate, a second sub array in which a plurality of apertures are arrayed on the thin plate, and a third sub array in which a plurality of apertures are arrayed on the thin plate; a blanking deflector array, in which a plurality of deflectors are arrayed, configured to deflect at least one of the plurality of charged particle beams divided by the aperture array; a stopping aperture array, in which a plurality of apertures are arrayed, configured to block the at least one deflected by the blanking deflector array; a deflector array in which a first deflector, which deflects a first plurality of charged particle beams divided by the first sub array, a second deflector, which deflects a second plurality of charged particle beams divided by the second sub array, and a third deflector, which deflects a third plurality of charged particle beams divided by the third sub array, are arrayed; a stage configured to hold the substrate; a driving device configured to drive the stage; and a controller configured to control the deflector array, the driving device, and the blanking deflector array, and perform blanking of the at least one by scanning, on the substrate, the first plurality of charged particle beams, the second plurality of charged particle beams, and the third plurality of charged particle beams, wherein, in order to reduce bending of the thin plate, in the aperture array, a spacer between the first sub array and the second sub array and a spacer between the second sub array and the third sub array are arranged, wherein a space between the second sub array and the third sub array is set narrower than a space between the first sub array and the second sub array, so that a first sub array drawing region, on which drawing with the first plurality of charged particle beams is performed, does not cross over a boundary between the first shot region and the second shot region, a second sub array drawing region, on which drawing with the second plurality of charged particle beams is performed, does not cross over the boundary, and a third sub array drawing region, on which drawing with the third plurality of charged particle beams is performed, crosses over the boundary, and, wherein the controller controls the deflector array, the driving device, and the blanking deflector array, so that, in parallel with the drawing on the first sub array drawing region being performed and the drawing on the second sub array drawing region being performed, drawing on the first shot region side of the boundary is not performed and drawing on the second shot region side of the boundary is performed on the third sub array drawing region. |
