发明名称 Thermal infrared sensor and manufacturing method thereof
摘要 A thermal infrared sensor includes an infrared ray absorbing film that is thermally separated from a semiconductor substrate by a hollow part; and a temperature sensor configured to detect temperature changes of the infrared ray absorbing film. The infrared ray absorbing film includes an infrared ray antireflection structure configured with a sub wavelength structure, the infrared ray antireflection structure being provided on a surface of the infrared ray absorbing film facing the semiconductor substrate.
申请公布号 US8927934(B2) 申请公布日期 2015.01.06
申请号 US201113227681 申请日期 2011.09.08
申请人 Ricoh Company, Ltd. 发明人 Noguchi Hidetaka
分类号 G01J5/00;G01J5/08;G01J5/02 主分类号 G01J5/00
代理机构 Cooper & Dunham LLP 代理人 Cooper & Dunham LLP
主权项 1. A thermal infrared sensor comprising: a sensor part including an infrared ray absorbing film that is separated from a semiconductor substrate by a hollow part; a temperature sensor configured to detect temperature changes of the infrared ray absorbing film; and wirings coupled to the temperature sensor, for obtaining electric potential of the temperature sensor, wherein the infrared ray absorbing film of the sensor part includes an infrared ray antireflection structure configured with a sub wavelength structure separated from the semiconductor substrate by the hollow part, the infrared ray antireflection structure being provided in direct contact with a surface of the infrared ray absorbing film of the sensor part facing the semiconductor substrate, and wherein infrared rays enter from a surface of the semiconductor substrate which is on a side of the semiconductor substrate on which the wirings are not formed.
地址 Tokyo JP