COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE FORMED A FILM BY SAID COMPOSITION, AND PATTERNING PROCESS USING SAID COMPOSITION

摘要

The present invention provides a composition for forming a coating type BPSG film, which has excellent adhesiveness to the micro patterns; is conveniently perform wet-etching with a stripper without causing damage against a coating type organic film and a CVD film having carbon as a main ingredient, which are necessary in a semiconductor substrate or a patterning process; and forms a BPSG film capable of suppressing the particle occurrence by forming in a coating process. The composition for forming a coating type BPSG film comprises at least one among structures having a silicate backbone represented by chemical formula (1), at least one among structures having a phosphate backbone represented by chemical formula (2), and at least one among structures having a borate backbone represented by chemical formula (3).