发明名称 PHOTOCURABLE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a fast-curing type photocurable composition which can be cured in a short time and has excellent workability.SOLUTION: There is provided a photocurable composition which comprises (A) a crosslinkable silicon group-containing organic polymer which preferably is a polyoxyalkylene-based polymer, a saturated hydrocarbon-based polymer or a poly(meth)acrylate-based polymer, (B) a photo-base generator which preferably is a photolatent tertiary amine, (C) an Si-F bond containing-low molecular weight silicon compound or high molecular weight silicon compound, and further (D) an active energy-ray cleavage type radical generator, a base proliferator and a conductive filler.SELECTED DRAWING: None
申请公布号 JP2016135852(A) 申请公布日期 2016.07.28
申请号 JP20150256085 申请日期 2015.12.28
申请人 CEMEDINE CO LTD 发明人 YAMAYA HIROSHI;OKAMURA NAOMI;SAITO ATSUSHI;KONO SHOMA
分类号 C08L101/10;C08J3/28;C08K5/17;C08K5/54;C08L101/04;C09D7/12;C09D201/10;C09J11/02;C09J201/10 主分类号 C08L101/10
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