| 摘要 |
PROBLEM TO BE SOLVED: To provide a focus measurement method capable of measuring a focus position with accuracy.SOLUTION: A focus measurement method includes emitting exposure light from a first direction to project first and second diffraction patterns onto a substrate, and emitting exposure light from a second direction to project third and fourth diffraction patterns onto the substrate. By measuring a distance between the first and third diffraction patterns on the substrate, a sum of a position deviation amount caused by focus deviation, and a superposition deviation amount between the first and third diffraction patterns, is calculated as a first position deviation amount. In addition, by measuring a distance between the second and fourth diffraction patterns on the substrate, a superposition deviation amount of the second and fourth diffraction patterns is calculated as a second position deviation amount. A focus deviation amount is calculated on the basis of the first and second position deviation amounts. |
