| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum treatment apparatus having a simple constitution capable of preventing a heating component such as a deposition preventive plate from having a high temperature during the treatment.SOLUTION: A sputtering device SM including an aluminum vacuum chamber 1, and having a deposition preventive plate 5 arranged inside, for emitting heat by receiving heat from a treatment executed in the vacuum chamber, is provided with a heat absorbing layer 7 having a higher thermal emissivity than a thermal emissivity of the deposition preventive plate on an inner wall part of the vacuum chamber irradiated with a heat ray radiated from the deposition preventive plate. |
