发明名称 COMPOUND SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a compound semiconductor device capable of obtaining excellent and stable withstand voltage, and a method for manufacturing the same.SOLUTION: A compound semiconductor device includes: a substrate 11; a nitride layer 12 formed on the surface of the substrate 11; an AlN layer 13 which is formed on the nitride layer 12 and has no pit with a diameter of 15 nm or more existing on the surface; and a compound semiconductor layer 14 which is formed above the AlN layer 13 and contains gallium and nitrogen. The compound semiconductor layer 14 includes: a superlattice buffer layer 15 formed above the AlN layer 13; and an active layer 16 formed above the superlattice buffer layer 15.
申请公布号 JP2015002341(A) 申请公布日期 2015.01.05
申请号 JP20130127905 申请日期 2013.06.18
申请人 FUJITSU LTD 发明人 TOMABECHI SHUICHI;KOTANI JUNJI
分类号 H01L21/338;H01L21/205;H01L29/778;H01L29/812 主分类号 H01L21/338
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