| 摘要 |
<p>PURPOSE: A substrate heating apparatus, a method thereof, and a storage medium thereof are provided to execute minute heating control for a substrate by flexibly setting a pattern of heating control region. CONSTITUTION: A substrate retention support supports a substrate(W). A light source(5a) heats the substrate. A light-shutter board(5b) is installed between the light source and the substrate. The light-shutter board comprises a light-shutter cell switched between a light transmission state and shielding state. A controller executes a switching control between the shielding state and the light transmission state about each of the light-shutter cell. A thermal plate(2) is indirectly heated by absorbing the light irradiated from the light source in an absorber layer(20).</p> |
