BATCH TYPE APPARATUS FOR PROCESSING SUBSTRATE

摘要

Disclosed is a batch type substrate processing apparatus capable of reducing an inner space. The batch type substrate processing apparatus according to the present invention includes a substrate processing unit (100) which receives a substrate loading unit (500) on which a plurality of substrates (40) are stacked and a gas supply unit (200) which supplies a substrate processing gas to the substrate processing unit (100). The substrate processing unit (100) has an uppermost surface which is flat.