发明名称 Tunneling diode, tunneling transistor, tunneling photodiode, and tunneling phototransistor with the structure of graphene-insulator-semiconductor
摘要 <p>A tunneling diode with a graphene-insulator-semiconductor structure according to the present invention includes a graphene layer, a non conductive layer which is stacked on the lower side of the graphene layer, a semiconductor layer which is stacked on the lower side of the non conductive layer, a first electrode which is formed on the graphene layer, and a second electrode which is formed on the semiconductor layer.</p>
申请公布号 KR101479395(B1) 申请公布日期 2015.01.05
申请号 KR20130024860 申请日期 2013.03.08
申请人 发明人
分类号 H01L29/772;H01L29/861 主分类号 H01L29/772
代理机构 代理人
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