发明名称 EPITAXIAL WAFER
摘要 <p>The present invention relates to an epitaxial wafer with high quality capable of improving a yield. The epitaxial wafer according to the present invention includes a substrate and an epitaxial structure which includes a buffer layer which is formed on the substrate and an active layer which is formed on the buffer layer. The basal plane dislocation density of the epitaxial structure is 0.1unit/cm^2 or less. The surface defect density of the active layer is 0.1unit/cm^2 or less.</p>
申请公布号 KR20150000317(A) 申请公布日期 2015.01.02
申请号 KR20130072620 申请日期 2013.06.24
申请人 LG INNOTEK CO., LTD. 发明人 KANG, SEOK MIN;KIM, JI HYE;BAE, HEUNG TEAK;HWANG, MIN YOUNG
分类号 H01L21/20 主分类号 H01L21/20
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