<p>The present invention relates to an epitaxial wafer with high quality capable of improving a yield. The epitaxial wafer according to the present invention includes a substrate and an epitaxial structure which includes a buffer layer which is formed on the substrate and an active layer which is formed on the buffer layer. The basal plane dislocation density of the epitaxial structure is 0.1unit/cm^2 or less. The surface defect density of the active layer is 0.1unit/cm^2 or less.</p>
申请公布号
KR20150000317(A)
申请公布日期
2015.01.02
申请号
KR20130072620
申请日期
2013.06.24
申请人
LG INNOTEK CO., LTD.
发明人
KANG, SEOK MIN;KIM, JI HYE;BAE, HEUNG TEAK;HWANG, MIN YOUNG