发明名称 METHOD OF MANUFACTURING SOLID-STATE IMAGING ELEMENT, SOLID-STATE IMAGING ELEMENT AND ELECTRONIC APPARATUS
摘要 A method of manufacturing a solid-state imaging element includes: manufacturing an element chip in which photoelectric conversion units are arranged on a main surface side; preparing a base configured using a material with an expansion coefficient greater than the element chip and having an opening of which the periphery of the opening is shaped as a flat surface; expanding the base by heating, mounting the element chip on the flat surface of the base in a state where the opening of the base is covered; and three-dimensionally curving a portion corresponding to the opening in the element chip by cooling and contracting the base in a state where the element chip is fixed to the flat surface of the expanded base.
申请公布号 US2015002711(A1) 申请公布日期 2015.01.01
申请号 US201414489156 申请日期 2014.09.17
申请人 Sony Corporation 发明人 Itonaga Kazuichiro
分类号 H04N5/369 主分类号 H04N5/369
代理机构 代理人
主权项 1. A solid-state imaging element comprising: an element chip having a curved portion curved three-dimensionally and a flat portion extended from a peripheral edge of the curved portion; and photoelectric conversion units arranged on a concave surface side of the curved portion in the element chip.
地址 Tokyo JP
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