发明名称 |
Quantum Tunneling Devices and Circuits with Lattice-Mismatched Semiconductor Structures |
摘要 |
Structures include a tunneling device disposed over first and second lattice-mismatched semiconductor materials. Process embodiments include forming tunneling devices over lattice-mismatched materials. |
申请公布号 |
US2015001469(A1) |
申请公布日期 |
2015.01.01 |
申请号 |
US201414485443 |
申请日期 |
2014.09.12 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
Cheng Zhiyuan;Sheen Calvin |
分类号 |
H01L29/12;H01L29/267;H01L29/08;H01L29/04 |
主分类号 |
H01L29/12 |
代理机构 |
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代理人 |
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主权项 |
1. A structure comprising:
a first device on a substrate, the substrate comprising a first crystalline semiconductor material; and a second device on the substrate and disposed on a second crystalline semiconductor material, the second device comprising a tunneling diode, the first device being electrically coupled to the second device, the second crystalline semiconductor material being lattice mismatched to the first crystalline semiconductor material, defects in the second crystalline semiconductor material arising from the lattice mismatch terminating at a lateral surface of the second crystalline semiconductor material. |
地址 |
Hsin-Chu TW |