| 发明名称 |
POROUS RESIN PARTICLES, METHOD FOR MANUFACTURING THE SAME, DISPERSION LIQUID, AND USE THEREOF |
| 摘要 |
Porous resin particles are disclosed that comprise a polymer of a monomer mixture. The monomer mixture includes: a mono(meth)acrylate-based monomer in an amount of 3 wt % to 40 wt % containing: an ethylenic unsaturated group only in a (meth)acrylic acid residue; and a hydroxyl group and at least either an ether group or an ester group in an alcohol residue; another monofunctional vinyl-based monomer in an amount of 10 wt % to 69 wt % containing a single ethylenic unsaturated group; and a polyfunctional vinyl-based monomer in an amount of 30 wt % to 70 wt % containing two or more ethylenic unsaturated groups. |
| 申请公布号 |
US2015004127(A1) |
申请公布日期 |
2015.01.01 |
| 申请号 |
US201214372116 |
申请日期 |
2012.07.31 |
| 申请人 |
SEKISUI PLASTICS CO., LTD. |
发明人 |
Ishimori Fumitaka;Harada Ryosuke |
| 分类号 |
A61K8/81;A61K8/02;A61Q19/00;A61Q1/12;C08F120/26;C08K5/05 |
主分类号 |
A61K8/81 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. Porous resin particles of a polymer of a monomer mixture, said monomer mixture comprising:
a mono(meth)acrylate-based monomer in an amount of 3 wt % to 40 wt % containing: an ethylenic unsaturated group only in a (meth)acrylic acid residue; and a hydroxyl group and at least either an ether group or an ester group in an alcohol residue; another monofunctional vinyl-based monomer in an amount of 10 wt % to 69 wt % containing a single ethylenic unsaturated group; and a polyfunctional vinyl-based monomer in an amount of 30 wt % to 70 wt % containing two or more ethylenic unsaturated groups. |
| 地址 |
Osaka-shi JP |
