发明名称 Method for Production of Optical Waveguides and Coupling and Devices Made from the Same
摘要 Novel processing methods for production of high-refractive index contrast and low loss optical waveguides are disclosed. In one embodiment, a “channel” waveguide is produced by first depositing a lower cladding material layer with a low refractive index on a base substrate and a refractory metal layer. Then, an etch mask layer is deposited on the refractory layer, followed by selective etching of the refractory metal layer with a dry-etch tool with high selectivity to the etch mask layer. Then, the refractory metal layer is oxidized to form an oxidized refractory metal region, and a top cladding layer made of a second low refractive index material to encapsulate the oxidized refractory metal region. In another embodiment, a “ridge” waveguide is produced by using similar process steps with an added step of depositing a high-refractive-index material layer and an optional optically-transparent layer.
申请公布号 US2015001175(A1) 申请公布日期 2015.01.01
申请号 US201414273002 申请日期 2014.05.08
申请人 Rabiei Payam 发明人 Rabiei Payam
分类号 G02B6/10;H01J37/32 主分类号 G02B6/10
代理机构 代理人
主权项 1. A method for producing a high-refractive index contrast and low loss optical waveguide, the method comprising the steps of: depositing a lower cladding material layer with a first low refractive index on a silicon base substrate; depositing or growing a refractory metal layer on top of the lower cladding material layer with the first low refractive index; forming an etch mask layer deposited on the refractory metal layer; selectively etching the refractory metal layer utilizing a dry-etching tool with high selectivity to the etch mask layer; oxidizing the refractory metal layer in high-temperature ambient oxygen, wherein the refractory metal layer subsequently forms an oxidized refractory metal region; and depositing a top cladding layer made of a second low refractive index material to encapsulate the oxidized refractory metal region on top of the lower cladding material layer.
地址 Orlando FL US